143-743 Seoul
Korea, Republic of (South Korea)
Sejong University
Low-k SiCOH, Plasma-enhanced chemical vapor deposition (PECVD), C5H16OSi Precursor, Oxygen/carbon ratio (O/C), Porosity, Computational simulation
Low-k SiCOH, Plasma-enhanced chemical vapor deposition (PECVD), C5H16OSi Precursor, Oxygen/carbon ratio (O/C), Porosity, computational simulation
Hafnium Zirconium Oxide, ferroelectric, volatile switching, Interface Engineering, Artificial nociceptor
photoelectrochemical water-splitting, tungsten trioxide, graphene, work function, Heterojunction
photoelectrochemical carbon dioxide reduction, copper bismuth oxide, cellulose nanofiber, photocathode