Kwanak-gu
Seoul, 151-742
Korea, Republic of (South Korea)
Seoul National University
Hafnium Zirconium Oxide, ferroelectric, volatile switching, Interface Engineering, Artificial nociceptor
Ferroelectricity, HZO (Hf0.5Zr0.5O2), NAND Flash, Rapid Thermal Annealing, Polarization Field Screening, Interface Engineering
Ferroelectric HZO (Hf0.5Zr0.5O2), Rapid Thermal Annealing (RTA), Polarization Field Screening, Interface engineering, Gallium Oxide(Ga2O3), Thermal stability