Seoul
Korea, Republic of (South Korea)
Hanyang University
Ferroelectricity, HZO (Hf0.5Zr0.5O2), NAND Flash, Rapid Thermal Annealing, Polarization Field Screening, Interface Engineering
Ferroelectric HZO (Hf0.5Zr0.5O2), Rapid Thermal Annealing (RTA), Polarization Field Screening, Interface engineering, Gallium Oxide(Ga2O3), Thermal stability