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5-hydroxymethylfurfural, 2, 5-furan dicarboxylic acid, base free, manganese oxide, continuous flow reaction, hypoxic condition
5-hydroxymethylfurfural, 2, 5-furan dicarboxylic acid, base free, manganese oxide, continuous flow reaction, low oxygen content
Photocatalysis, H2O2 production, Oxygen reduction, Resorcinol-formaldehyde resin, D-A structure, N, N-dimethylaniline