affiliation not provided to SSRN
Photocatalytic H2O2 production, Dual electric field, Ferroelectric polarization electric field, Internal electric field
Chemical mechanical polishing, Silicon wafer, Silica abrasives, Organo-superbase, Amino acid, Ultrasmooth surface
5-hydroxymethylfurfural, 2, 5-furan dicarboxylic acid, base free, manganese oxide, continuous flow reaction, low oxygen content
Extra-Large-Pore Zeolite, Carbon dots, room-temperature phosphorescence, dual-template strategy
Photocatalysis, H2O2 production, Oxygen reduction, Resorcinol-formaldehyde resin, D-A structure, N, N-dimethylaniline
5-hydroxymethylfurfural, 2, 5-furan dicarboxylic acid, base free, manganese oxide, continuous flow reaction, hypoxic condition
2, 2, 6, 6-Tetramethylpiperidinyl-1-oxyl, Open-shell organic radicals, Photothermal effect, 5-hydroxymethylfurfural
MOF-derived, Electrochemical sensor, simultaneous detection, dopamine, Uric Acid