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Jeong-Min Lee

affiliation not provided to SSRN

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Atomic Layer Deposition of Selective Sio2 Thin Films Using Silane Self-Assembled Monolayers on Silicon Versus Amorphous Carbon

Number of pages: 8 Posted: 25 Feb 2025
Seo-Hyun Lee, Jeong-Min Lee, Jiwoo Oh, Jieun Oh, Myongjong Kwon, Byungha Park and Woo-Hee Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Hanyang University
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Abstract:

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Area-selective atomic layer deposition, Silicon oxide, Silane self-assembled monolayer, Surface modification, Growth retardation