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Shih-Ting Chuang

Chang Gung University

Tauyuan

Taiwan

SCHOLARLY PAPERS

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Scholarly Papers (1)

1.

Impact of Nitrogen Plasma Treatment on the Tin Bottom Electrode and Ferroelectric Properties of Tin/Hf0.5zr0.5o2/Tin Capacitors

Number of pages: 42 Posted: 03 Mar 2025
Tung-Ming Pan, Shih-Ting Chuang, Wei-Che Weng and Jim-Long Her
Chang Gung University, Chang Gung University, Chang Gung University and Chang Gung University
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Abstract:

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Hf0.5Zr0.5O2 (HZO), atomic layer deposited (ALD), TiN bottom electrode, TiOxNy interfacial layer