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Dong-Won Kwon

Gyeongsang National University

Chinju City

Korea, Republic of (South Korea)

  • Gyeongsang National University

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Scholarly Papers (1)

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Atomic Layer Deposition of MoO₂ Using a Tetravalent Precursor for Template-Driven Rutile TiO₂ Growth in DRAM Capacitor

Number of pages: 24 Posted: 01 Dec 2025
Yoonchul Shin, Yeon-Ji Jeon, Ji Hwan Kim, Chan-Bin Hong, Chang Mo Yoon, Dong-Won Kwon, Se Yun Kim and Ji-hoon Ahn
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Gyeongsang National University, Gyeongsang National University and Hanyang University
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Abstract:

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Atomic layer deposition, MoO2, Template effect, Rutile TiO2, Equivalent oxide thickness, DRAM capacitor