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Evaluating Mechanical Properties of 100nm-Thick Atomic Layer Deposited Al2o3 as a Free-Standing Film
22 Pages Posted: 29 Apr 2020 Publication Status: Accepted
Abstract
The mechanical properties of free-standing atomic layer-deposited alumina thin films were evaluated in this study. Stress-strain curves were obtained by measuring alumina films floating on the water surface. The Young's modulus, strength, and elongation of the free-standing films were analyzed at varying deposition temperatures of 80-200°C. The results show that the mechanical properties improve with increasing temperature. The microstructures of the films were examined to explain the change of the mechanical properties depending on the deposition conditions. Finally, the underlying causes of the differences in the mechanical properties were analyzed by evaluating the chemical composition of the thin films.
Keywords: atomic layer deposition, alumina, tensile test, thin film, mechanical properties
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