Indium Oxide (InOx), Plasma-Enhanced Atomic Layer Deposition (PEALD), DADI ([3-(dimethylamino)propyl] dimethyl indium) precursor, Crystallinity, Thin-Film Transistor (TFT)
Indium Oxide (InOx), Plasma-Enhanced Atomic Layer Deposition (PEALD), DADI ([3-(dimethylamino)propyl] dimethyl indium) precursor, Crystallinity, Thin-Film Transistor (TFT).
Indium oxide, atomic layer deposition, oxygen reactants, substrate temperature, crystallinity.