default author photo

Tongqing Wang

Tsinghua University

Beijing, 100084

China

  • Tsinghua University

SCHOLARLY PAPERS

2

DOWNLOADS

122

TOTAL CITATIONS

0

Scholarly Papers (2)

Actions:
Email selected abstracts
1.

Research on Polishing Mechanisms of Various Surfactants in Chemical Mechanical Polishing Relevant to Cobalt Interconnects

Number of pages: 20 Posted: 03 Feb 2023
Lifei Zhang, Shuhui Wang, Tongqing Wang and Xinchun Lu
Tsinghua University, Tsinghua University, Tsinghua University and Tsinghua University
Downloads 76 (830,555)

Abstract:

Loading...

Cobalt Interconnects, Chemical Mechanical Polishing, Heterogeneous Materials, Various Surfactants, Polishing Mechanisms.

2.

The Role of Diethanolamine on Chemical Mechanical Polishing in Alkaline Glycine-Based Slurries for Cobalt Interconnects

Number of pages: 20 Posted: 02 Dec 2022
Lifei Zhang, Tongqing Wang, Shunfan Xie and Xinchun Lu
Tsinghua University, Tsinghua University, Tsinghua University and Tsinghua University
Downloads 46 (1,121,190)

Abstract:

Loading...

Cobalt Interconnects, Chemical Mechanical Polishing, Diethanolamine, Auxiliary Complexing Agent, Corrosion Inhibitor