Karla Hiller

Chemnitz University of Technology

09107

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Characterization of Plasma-Activated, Thermally-Annealed Si-Sio2 Direct Bond Strength for Vapor Hf Etching

Number of pages: 7 Posted: 28 Jun 2023

Tianjiao Gong, Yukio Suzuki, Karla Hiller and Shuji Tanaka

Tohoku University, Tohoku University, Chemnitz University of Technology and Tohoku University

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