169-148, Gwahak-ro
Yuseong-gu
Daejeon
Korea, Republic of (South Korea)
Korea Basic Science Institute (KBSI)
VO2, Insulator-Metal Transition, Hydrogen Incorporation, V-V dimer
oxide materials, thin films, semiconductors, electrical transport, electronic properties, computer simulations
AlN, Si implantation, nitrogen defect, out-diffusion, Schottky contact, carrier transport