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Jose Alfonso Campo

Universidad Nacional de Ingeniería

Avenida Túpac Amaru 210

Lima, lima 25

Peru

  • Universidad Nacional de Ingeniería

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Plasma Parameters Analysis in Dc and Rf Magnetron Sputtering Using Finite Element Method

Number of pages: 13 Posted: 25 May 2024
Noely Zully Calderon, Carlo Becerra, Jose Alfonso Campo, Jaime Paul Carreño, Humberto Torreblanca, Michael Stüber, Sven Ulrich and Rolf Grieseler
affiliation not provided to SSRN, Universidad Nacional de Ingeniería, Universidad Nacional de Ingeniería, Universidad Nacional de Ingeniería, affiliation not provided to SSRN, Karlsruhe Institute of Technology, Karlsruhe Institute of Technology and Pontificia Universidad Catolica del Peru
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Magnetron sputtering, thin films, plasma modelling, glow discharge, FEM.