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Zhengmiao Fu

Beijing Technology and Business University

No. 11/33, Fucheng Road, Haidian District

Liangxiang

Beijing, 102488

China

SCHOLARLY PAPERS

1

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56

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0

Scholarly Papers (1)

1.

Atomic-scale study on nanoparticle removal mechanism during post-Cu CMP cleaning process using ReaxFF MD

Number of pages: 38 Posted: 04 Sep 2025
Tsinghua University, Tsinghua University, Beijing Technology and Business University, Tsinghua University, Beijing Technology and Business University and Beijing Technology and Business University
Downloads 56 (1,020,567)

Abstract:

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Post-Cu CMP cleaning, Reactive force field molecular dynamics, silica nanoparticle deposition, silica nanoparticle removal.