Palaiseau, 91128
France
Institut Polytechnique de Paris - Le Laboratoire de physique des interfaces et couches minces (LPICM)
IBC-HJT, PECVD, crystalline silicon, patterned plasma etching
GaN, interface, Si, meltback etching, plasma
HJT-IBC, Patterned plasma etching, H2 plasma cleaning, XPS, HRTEM
Silicon heterojunction solar cells, Doped nanocrytalline silicon, Film continuity, Open circuit voltage, Cross-sectional TEM, Ellipsometry
Nanocrystalline silicon oxide, P-type, Plasma deposition, Silicon nanocrystals, Disorder parameter, Silicon heterojunction solar cells