affiliation not provided to SSRN
silicon oxynitride, chemical vapor deposition, electronic structure, XPS, FTIR, memristors
GeOx films, Raman spectroscopy, disproportionation reaction, JMAK model, activation energy
GeOx films, Raman spectroscopy, disproportionation reaction, JMAK model, activation energy.
Silicon, sapphire, ferroelectric, HfO2 interlayer, phases, pseudo-MOSFETs
MIS structures, Schottky barrier, GeSixOy, ITO, photocurrent amplification