No 1088, xueyuan Rd.
Xili, Nanshan District
Shenzhen, 518055
China
Southern University of Science and Technology
Atom-selective etching, Atomic and close-to-atomic scale manufacturing, Etching mode, Roughness, Single-crystal silicon
Thermal etching, GaN, Inductively coupled plasma, Damage relief
Microwave plasma jet, Spline curve electrode, Plasma machining, Dwell time algorithm
