Shenyang
China
Liaoning University
A1. Characterization, A1. Defects, A1. Surface Morphology, A3. Chemical vapor deposition processes, B2. Semiconducting silicon compounds
A1. Characterization, A1. Defects, A1. Surface Morphology, A3. Chemical vapor deposition processes, B2. Semiconducting silicon compounds.
4H-SiC, epitaxial growth, First-principles calculations, surface migration