Dongguan, 523808
China
Chinese Academy of Sciences (CAS) - Songshan Lake Materials Laboratory
A1. Characterization, A1. Defects, A1. Surface Morphology, A3. Chemical vapor deposition processes, B2. Semiconducting silicon compounds
Keywords: A1. defects, A1. Characterization, A1. Etching, A1. Optical microscopy, B2. Semiconducting silicon compounds.
A1. Characterization, A1. Defects, A1. Surface Morphology, A3. Chemical vapor deposition processes, B2. Semiconducting silicon compounds.
4H-SiC, Basal plane dislocation, Nitrogen doping, Anisotropic etching, Sector angle, Dislocation conversion