Furo-cho, Chikusa-ku
Nagoya-City , 4648601
Japan
Nagoya University
GaN, Si (111) substrate, Radical enhanced MOCVD, LT-GaN buffer layer, N-terminated Si.
Gallium nitrite (GaN)GaN/Si templateRadical Enhanced MOCVD Crystal quality improvement
Gallium nitride, REMOCVD, high-quality GaN, water-cooled nozzle.