Extreme Ultraviolet Lithography (EUVL), Tin-oxo cage, Density Functional Theory (DFT)
Sn contamination, Ruthenium oxide, In-situ and non-destructive cleaning, Adsorption and desorption, Oxygen vacancy
EUV multilayer mirror, Hydrogen plasma cleaning, Sn particles, Ion energy, Ion thermal effect
Tin particles, Hydrogen plasma, In-situ non-destructive cleaning, Chemical etching, Ion energy
EUV Multi-layer Mirror, Ruthenium Surface, Sn Contaminant, Hydrogen Plasma Cleaning, Matrix Effect
EUV mirrors, Hydrogen plasma cleaning, Sn particles, Ion energy, Ion thermal effect
Mo meshes, liquid Sn, hydrogen plasma, corrosion resistance, heat healing
EUV Lithography, Carbon interaction dynamics, Carbon Contamination, Ruthenium surface
Ru Surface, Sn Contaminant, Hydrogen Plasma Cleaning, Re-deposition Equilibrium and mitigation
potential energy function, vibrational spectrum, partition function, thermodynamic properties
TC11 titanium alloyElectron beam powder bed fusionHot isostatic pressingTextureVariant selection
Hydrogen, Ruthenium, Vacancy, Trapping, diffusion
