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Chulwoo Bae

affiliation not provided to SSRN

  • affiliation not provided to SSRN

SCHOLARLY PAPERS

3

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144

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0

Scholarly Papers (3)

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1.

Synergistic Effects of Surfactants on Ceria Removal Efficiency During Sc1-Based Post-Cmp Cleaning

Number of pages: 26 Posted: 10 Jun 2025
Ju Yong Lee, Chulwoo Bae, Jungjae Park, Jongjin Kim and Taesung Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Sungkyunkwan University
Downloads 50 (1,074,648)

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Chemical mechanical planarization, SC1 cleaning, Surfactant, Micelle, Electrostatic repulsion

2.

Effect of Fe-Complex Catalysts on Passivation Layer and Hydroxyl Radical Generation During Tungsten Chemical Mechanical Planarization

Number of pages: 48 Posted: 28 Jan 2025
Hyunho Kim, Gyuyoung Lee, Seunghwan Lee, Pengzhan Liu, Jongyeong Jeon, Ziyang Wang, Chaerin Park, Jaewon Lee, Hosin Hwang, Chulwoo Bae and Taesung Kim
Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN and Sungkyunkwan University
Downloads 48 (1,097,529)

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Tungsten CMP, Fe-complex catalyst, Passivation layer, Hydroxyl radical (*OH), Fenton reaction

3.

Application of an Electrospray Scanning Mobility Particle Sizer to Mixed Abrasive Slurry for Chemical Mechanical Planarization

Number of pages: 14 Posted: 02 Sep 2022
Donggeon Kwak, Juhwan Kim, Seungjun Oh, Chulwoo Bae and Taesung Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Sungkyunkwan University
Downloads 46 (1,145,425)

Abstract:

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Chemical mechanical planarization, Particle size distribution, Mixed abrasive slurry, Scanning mobility particle sizer, Non-volatile residue