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Hosin Hwang

Sungkyunkwan University

SCHOLARLY PAPERS

3

DOWNLOADS

211

TOTAL CITATIONS

0

Scholarly Papers (3)

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1.

Selectivity Control with Concurrent Enhancement of Inhibition in Cu/Sio2 Cmp Via Polyvinylpyrrolidone Adsorption

Number of pages: 40 Posted: 08 Feb 2025
Taesung Kim, Hosin Hwang, Seunghwan Lee, Jinhyoung Lee, Ziyang Wang, Dayoung Yu, Hyeonjeong Lee and Hyunho Kim
Sungkyunkwan University, Sungkyunkwan University, affiliation not provided to SSRN, Sungkyunkwan University - Natural Sciences Campus, Sungkyunkwan University, affiliation not provided to SSRN, Sungkyunkwan University and affiliation not provided to SSRN
Downloads 111 (635,507)

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Chemical mechanical planarization, Polyvinylpyrrolidone, Selectivity, Corrosion, Inhibitor

2.

Investigation of Cleaning Mechanisms for Particle, Metal Ion, and Organic Contaminations in Amorphous Carbon Post-Cmp Cleaning

Number of pages: 27 Posted: 18 Aug 2025
Ziyang Wang, Pengzhan Liu, Juyong Lee, Hyeonjeong Lee, Hyunho Kim, Hosin Hwang, Yinhao An and Taesung Kim
Sungkyunkwan University, Sungkyunkwan University, Sungkyunkwan University, Sungkyunkwan University, Sungkyunkwan University, Sungkyunkwan University, Sungkyunkwan University and Sungkyunkwan University
Downloads 52 (1,063,489)

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Amorphous carbon, Chemical Mechanical Polishing, post-CMP cleaning, CMP contamination, Cleaning mechanism

3.

Effect of Fe-Complex Catalysts on Passivation Layer and Hydroxyl Radical Generation During Tungsten Chemical Mechanical Planarization

Number of pages: 48 Posted: 28 Jan 2025
Hyunho Kim, Gyuyoung Lee, Seunghwan Lee, Pengzhan Liu, Jongyeong Jeon, Ziyang Wang, Chaerin Park, Jaewon Lee, Hosin Hwang, Chulwoo Bae and Taesung Kim
Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN and Sungkyunkwan University
Downloads 48 (1,097,529)

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Tungsten CMP, Fe-complex catalyst, Passivation layer, Hydroxyl radical (*OH), Fenton reaction