ternary system, hardmask, etch selectivity, amorphous carbon, physical vapor deposition
Amorphous carbon, boron, DC sputtering, Hardmask, dry etch, Selectivity
Nanovoid, Electrical resistivity/conductivity, Copper alloys, Fatigue test, Microstructure
Nanovoid, Electrical resistivity/conductivity, copper alloys, Fatigue test, Microstructure
Cu Ag alloy, Chip to Chip bonding, Thermo-compression bonding, Adhesion, Double cantilever beam test