default author photo

Jongyeong Jeon

affiliation not provided to SSRN

  • affiliation not provided to SSRN

SCHOLARLY PAPERS

2

DOWNLOADS

108

TOTAL CITATIONS

0

Scholarly Papers (2)

Actions:
Email selected abstracts
1.

Environmentally Friendly Complex Corrosion Inhibitor Using Potassium Oleate and Poly (Sodium 4-Styrene Sulfonate) in Copper Chemical Mechanical Planarization

Number of pages: 31 Posted: 05 Feb 2025
Taesung Kim, Jongyeong Jeon, Seungjun Oh, Seulki Kim, Yesol Kang, Jinhyoung Lee, Hyunho Kim, Geumji Back and Juyeol Lee
Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN and affiliation not provided to SSRN
Downloads 77 (852,604)

Abstract:

Loading...

Copper chemical mechanical planarization (Cu CMP), Environmentally friendly inhibitor, Surfactant-polymer complex, potassium oleate, poly (sodium 4-styrene sulfonate)

2.

Control of Ta/Cu Selectivity in Barrier Chemical Mechanical Planarization Via Surface-Charge-Modified Silica Abrasives

Number of pages: 50 Posted: 18 Aug 2025
Jongyeong Jeon, Hyunho Kim, Dayoung Yu, Junhyeong Jeon, Kieun Kwak, Heonjae Kim, Injoon Heo, Hyeonjeong Lee, Yechan Kim, Junil Cho and Taesung Kim
affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Sungkyunkwan University, affiliation not provided to SSRN, affiliation not provided to SSRN and Sungkyunkwan University
Downloads 31 (1,345,526)

Abstract:

Loading...

Silica surface modification, Selectivity, Electrostatic interaction, Barrier CMP