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Duan-Chen Peng

Xiamen University of Technology

Xiamen

China

  • Xiamen University of Technology

SCHOLARLY PAPERS

2

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Scholarly Papers (2)

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1.

Plasma Power Effect on Crystallinity and Density of Peald-Aln Thin Films： Toward Increasing Dielectric Constant and Breakdown Electric Field

Number of pages: 44 Posted: 20 Jun 2023
Xiao-Ying Zhang, Duan-Chen Peng, Jia-Hao Yan, Zhi-Xuan Zhang, Yu-Jiao Ruan, Juan Zuo, An Xie, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Feng-Min Lai, Shui-Yang Lien and W. Z. Zhu
Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, National United University, National Chi Nan University, National University of Kaohsiung, Da-Yeh University, Xiamen University of Technology and Xiamen University of Technology
Downloads 49 (1,074,648)

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Keywords: Aluminum nitride, Density, Crystallinity, Breakdown electric field, Remote plasma atomic layer deposition

2.

High-Quality Aln/Gan Layers with Low Dislocation Density Deposited on Sapphire Substrate by Plasma-Enhanced Ald

Number of pages: 39 Posted: 16 Sep 2022
Xiao-Ying Zhang, Duan-Chen Peng, Jing han, Fang-Bin Ren, Shi-Cong Jiang, Ming-Chun Tseng, Yu-Jiao Ruan, Juan Zuo, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Shui-Yang Lien and W. Z. Zhu
Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, Xiamen University of Technology, National United University, National Chi Nan University, National University of Kaohsiung, Xiamen University of Technology and Xiamen University of Technology
Downloads 35 (1,249,711)

Abstract:

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Keywords: Aluminum nitride, atomic layer deposition, substrate temperature.